CEE Apogee 200 Benchtop Spin Coater

Tabletop photoresist spin coater for use with wafers up to 200mm.

Eliminate process variability from your critical experiments with the Cee® Apogee® Spin Coater. This compact system delivers track-quality performance with its durable, chemically compatible design and fully programmable, user-friendly operation.

Full-color touchscreen graphical user interface (GUI).

 Supports unlimited user-defined program steps for each recipe.

0.1  second step time resolution (9,999.9 seconds maximum step time)

Spin speeds up to 12,000rpm.

 Spin speed acceleration up to 30,000rpm/s unloaded.

Multiple simultaneous automated dispense capability.

 In-process dynamic speed & acceleration control

Substrate sizes: 200mm round; 6" x 6" square (max)

Acceleration 0 to 13000 rpm/s with a 200mm substrate

110V,50/60Hz, 6A

SYSTEM HAS PHOTORESIST STAINS FROM PREVIOUS OWNER.