Mesoestetic Sensitive Anti-Stress Mask is an intensive treatment specifically formulated to soothe and relieve skin experiencing redness and sensitivity. This gentle yet effective mask works to calm inflammation and reduce visible signs of irritation for a more comfortable, balanced complexion.

The advanced formula features Rhodosorus marinus extract and saffron flower, which act directly on the signs of inflammation, skin sensitivity, and redness. A soothing plant complex combining Aloe vera, chamomile, and marigold provides regenerating, calming, and smoothing benefits to stressed skin, while post-biotic actives strengthen the skin's natural barrier function.

Mesoestetic Sensitive Anti-Stress Mask is available in: 100ml

Key Benefits:

• Calms inflammation and reduces visible redness with botanical extracts for immediate relief
• Strengthens the skin barrier with post-biotic ingredients to prevent future sensitivity
• Protects against pollution damage while reducing oxidative stress that can aggravate sensitive skin

Formulated Without:

Parabens, Silicones, Petroleum Derivatives, Phthalates, Sulphates, Alcohol

USAGE & INGREDIENTS:

How to Use Mesoestetic Sensitive Anti-Stress Mask:

1. Apply a generous layer to clean, dry skin, avoiding the eye area.
   Leave on for 15-20 minutes, allowing the active ingredients to penetrate.
2. Remove excess product with a soft tissue or rinse with lukewarm water.

Make Mesoestetic Sensitive Anti-Stress Mask part of your weekly skincare ritual for calmer, more comfortable skin.

Ingredients:

Aqua, Helianthus Annuus Seed Oil, Glycerin, Propylene Glycol, Biosaccharide Gum-2, Caprylic/Capric Triglyceride, PEG-7 Glyceryl Cocoate, Phenoxyethanol, PEG/PPG-14/4 Dimethicone, Polyacrylamide, Acrylates/C10-30 Alkyl Acrylate Crosspolymer, Tocopherol, C13-14 Isoparaffin, Menthyl Lactate, Aloe Barbadensis Leaf Powder, BHT, BHA, Rosmarinus Officinalis Leaf Extract, Parfum, Ethylhexylglycerin, Laureth-7, Chamomilla Recutita Extract, Calendula Officinalis Flower Extract, Potassium Sorbate.